Nikon Begins Accepting Orders for the FX-6ASLH, the World's First Submicron-Resolution FPD Lithography System
Nikon begins taking orders for the FX-6ASLH, the first FPD lithography system to achieve submicron resolution of 0.85 µm, designed for G6 plate sizes in high-definition OLED and LCD production.
Nikon Corporation has initiated order acceptance for the FX-6ASLH, a flat-panel display (FPD) lithography system that achieves a resolution of 0.85 micrometers in line-and-space patterns. This marks the first time an FPD lithography system has delivered submicron resolution, addressing the growing demand for higher-definition displays in advanced smart devices. The system is optimized for G6 plate sizes, which measure 1,500 mm × 1,850 mm, commonly used for small- and medium-sized panels.
The FX-6ASLH incorporates a newly developed illumination optical system featuring a UV-LED light source, enabling resolutions of 0.85 µm (L/S) and 1.0 µm (C/H) on G6 plates. This innovation allows the system to perform exposure across entire substrates with uniform linewidths, even on large plates prone to distortion, by correcting focus in real time.
Nikon’s proprietary multi-lens control technology, referred to as its multi-lens system, precisely adjusts each lens according to substrate conditions to achieve overlay accuracy of ±0.18 µm or better. This level of precision is the highest among FPD lithography systems supporting G6 plates, contributing to high-yield mass-production processes for high-definition OLED and LCD panels.
The adoption of a high-intensity UV-LED light source in the FX-6ASLH delivers both submicron resolution and high productivity, enhancing overall system performance. Orders for the FX-6ASLH are now being accepted, with delivery schedules and specifications subject to change based on customer requirements and system configuration.